ATOMIC INTER-DIFFUSION AT AU-GAAS INTERFACES STUDIED WITH AL INTERLAYERS

被引：30

作者：

BRILLSON, LJ ^{[1
]}

BAUER, RS ^{[1
]}

BACHRACH, RZ ^{[1
]}

HANSSON, G ^{[1
]}

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

来源：

PHYSICAL REVIEW B | 1981年 / 23卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.23.6204

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6204 / 6215

页数：12

共 91 条

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