THE INFLUENCE OF A HF AND AN ANNEALING TREATMENT ON THE BARRIER HEIGHT OF P-TYPE AND N-TYPE SI MIS STRUCTURES

被引：57

作者：

HANSELAER, PL

LAFLERE, WH

VANMEIRHAEGHE, RL

CARDON, F

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1986年 / 39卷 / 02期

关键词：

D O I：

10.1007/BF00616830

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：129 / 133

页数：5

共 27 条

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