NEW INORGANIC ELECTRON RESIST OF HIGH CONTRAST

被引：96

作者：

YOSHIKAWA, A ^{[1
]}

OCHI, O ^{[1
]}

NAGAI, H ^{[1
]}

MIZUSHIMA, Y ^{[1
]}

机构：

[1] NIPPON TELEG & TEL PUB CORP,MUSASHINO ELECT COMMUN LAB,MUSASHINO,TOKYO,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1977年 / 31卷 / 03期

关键词：

D O I：

10.1063/1.89624

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：161 / 163

页数：3

共 7 条

[1]

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[4] NEW APPLICATION OF SE-GE GLASSES TO SILICON MICROFABRICATION TECHNOLOGY [J].

NAGAI, H ;

YOSHIKAWA, A ;

TOYOSHIMA, Y ;

OCHI, O ;

MIZUSHIMA, Y .

APPLIED PHYSICS LETTERS, 1976, 28 (03) :145-147

[5]

SAKUMA H, 1972, OYO BUTURI S, V41, P76

[6]

SHIRAKAWA T, 1975, PHOTOGR SCI ENG, V19, P139

[7] NOVEL INORGANIC PHOTORESIST UTILIZING AG PHOTODOPING IN SE-GE GLASS-FILMS [J].

YOSHIKAWA, A ;

OCHI, O ;

NAGAI, H ;

MIZUSHIMA, Y .

APPLIED PHYSICS LETTERS, 1976, 29 (10) :677-679

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