ELECTRON-BEAM WRITING OF CONTINUOUS RESIST PROFILES FOR OPTICAL APPLICATIONS

被引：23

作者：

STAUFFER, JM ^{[1
]}

OPPLIGER, Y ^{[1
]}

REGNAULT, P ^{[1
]}

BARALDI, L ^{[1
]}

GALE, MT ^{[1
]}

机构：

[1] PAUL SCHERRER INST ZURICH,CH-8048 ZURICH,SWITZERLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.586051

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This article reports on progress in the fabrication by e-beam lithography of high resolution, continuous-relief microstructures for integrated optical applications in the visible and near infrared. The microstructures are designed for subsequent replications from an electroformed metal shim by embossing into polymer films on glass. The objective of this work is to fabricate complete integrated optical devices and circuits by low-cost embossing or casting replication technology.

引用

页码：2526 / 2529

页数：4

共 4 条

[1] BLAZED X-RAY REFLECTION GRATINGS FABRICATED BY ELECTRON-BEAM LITHOGRAPHY [J].