ELECTRICAL-RESISTIVITY AND HALL-EFFECT OF TISI2 THIN-FILMS IN THE TEMPERATURE-RANGE OF 2-300-K

被引：10

作者：

LI, BZ

ZHANG, AM

JIANG, GB

AITKEN, RG

DANESHVAR, K

机构：

[1] UNIV N CAROLINA,DEPT PHYS,CHARLOTTE,NC 28223

[2] UNIV N CAROLINA,DEPT ELECT ENGN,CHARLOTTE,NC 28223

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 11期

关键词：

D O I：

10.1063/1.343689

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5416 / 5421

页数：6

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