CONSIDERATIONS OF ION CHANNELING FOR SEMICONDUCTOR MICROSTRUCTURE FABRICATION

被引：12

作者：

MYERS, DR

WILSON, RG

COMAS, J

机构：

[1] HUGHES RES LABS,MALIBU,CA 90265

[2] USN,RES LAB,WASHINGTON,DC 20375

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570322

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1893 / 1896

页数：4

共 29 条

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