ELECTRICAL-PROPERTIES OF MOLECULAR-BEAM EPITAXY PRODUCED HGCDTE LAYERS DOPED DURING GROWTH

被引:21
作者
BOUKERCHE, M
WIJEWARNASURIYA, PS
RENO, J
SOU, IK
FAURIE, JP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 04期
关键词
D O I
10.1116/1.574029
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2072 / 2076
页数:5
相关论文
共 29 条
  • [1] ELECTRON-MOBILITY IN LPE HG1-XCDXTE/CDTE LAYERS NEAR ZERO BAND-GAP CROSSING
    BAJAJ, J
    SHIN, SH
    BOSTRUP, G
    CHEUNG, DT
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (01): : 244 - 246
  • [3] GROWTH OF (100) CDTE-FILMS OF HIGH STRUCTURAL PERFECTION ON (100) GAAS SUBSTRATES BY MOLECULAR-BEAM EPITAXY
    BICKNELL, RN
    YANKA, RW
    GILES, NC
    SCHETZINA, JF
    MAGEE, TJ
    LEUNG, C
    KAWAYOSHI, H
    [J]. APPLIED PHYSICS LETTERS, 1984, 44 (03) : 313 - 315
  • [4] BLACKMORE JS, 1962, SEMICONDUCTOR STATIS
  • [5] BOUKERCHE M, J APPL PHYS
  • [6] MAGNETOCONDUCTIVE CORRECTION FACTORS FOR AN ISOTROPIC HALL PLATE WITH POINT SOURCES
    BUEHLER, MG
    PEARSON, GL
    [J]. SOLID-STATE ELECTRONICS, 1966, 9 (05) : 395 - &
  • [7] HETEROEPITAXIAL GROWTH OF CDTE ON GAAS BY LASER ASSISTED DEPOSITION
    CHEUNG, JT
    KHOSHNEVISAN, M
    MAGEE, T
    [J]. APPLIED PHYSICS LETTERS, 1983, 43 (05) : 462 - 464
  • [8] CONTACT SIZE EFFECTS ON VAN VANDERPAUW METHOD FOR RESISTIVITY AND HALL-COEFFICIENT MEASUREMENT
    CHWANG, R
    SMITH, BJ
    CROWELL, CR
    [J]. SOLID-STATE ELECTRONICS, 1974, 17 (12) : 1217 - 1227
  • [9] MOLECULAR-BEAM EPITAXIAL-GROWTH OF HIGH-QUALITY HGTE AND HG1-XCDXTE ONTO GAAS (001) SUBSTRATES
    FAURIE, JP
    SIVANANTHAN, S
    BOUKERCHE, M
    RENO, J
    [J]. APPLIED PHYSICS LETTERS, 1984, 45 (12) : 1307 - 1309
  • [10] LATEST DEVELOPMENTS IN THE GROWTH OF CDXHG1-XTE AND CDTE-HGTE SUPER-LATTICES BY MOLECULAR-BEAM EPITAXY
    FAURIE, JP
    MILLION, A
    BOCH, R
    TISSOT, JL
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03): : 1593 - 1597