SURFACE AND THIN-FILM ANALYSIS - CONCEPTS, CAPABILITIES AND LIMITATIONS

被引：13

作者：

HOFMANN, S

机构：

[1] Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaften, 7000 Stuttgart

来源：

TALANTA | 1979年 / 26卷 / 08期

关键词：

D O I：

10.1016/0039-9140(79)80171-X

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

A brief survey of the concepts and limiting conditions of instrumental surface-analysis techniques and their use for in-depth distribution analysis of thin films is presented. The basic differences between the most important methods: Photoelectron Spectroscopy (ESCA), Auger Electron Spectroscopy (AES), Secondary-Ion Mass-Spectrometry (SIMS) and Ion-Scattering Spectrometry (ISS) are outlined. Examples of compositional profiles obtained in combination with sputtering illustrate the influence of information depth and of bombardment-induced micro-roughening on the accuracy of in-depth analysis. © 1979.

引用

页码：665 / 673

页数：9

共 43 条

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