TEMPERATURE-DEPENDENCE OF BAND-GAP CHANGE IN INN AND ALN

被引:170
作者
GUO, QX [1 ]
YOSHIDA, A [1 ]
机构
[1] TOYOHASHI UNIV TECHNOL,DEPT ELECT & ELECTR ENGN,TOYOHASHI 441,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 5A期
关键词
INN; ALN; SINGLE CRYSTAL; III-V SEMICONDUCTORS; OPTICAL BAND GAP; TEMPERATURE DEPENDENCE;
D O I
10.1143/JJAP.33.2453
中图分类号
O59 [应用物理学];
学科分类号
摘要
The optical band gap of InN and AlN single crystal films was measured through absorption spectra in the temperature range of 4.2 to 300 K. The samples were grown on (0001)alpha-Al2O3 substrates by metalorganic vapor phase epitaxy. The Varshni equation and the Bose-Einstein expression have been compared with the experimental results. The nitride III-V compound semiconductors have smaller temperature dependence of band gap change. In III-V compound semiconductors, the variation of the band gap change increases in the order of N, P and As.
引用
收藏
页码:2453 / 2456
页数:4
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