BREAKDOWN SPEED CONSIDERATIONS IN INP/INGAAS SINGLE-HETEROSTRUCTURE AND DOUBLE-HETEROSTRUCTURE BIPOLAR-TRANSISTORS

被引:25
作者
CHAU, HF
PAVLIDIS, D
HU, J
TOMIZAWA, K
机构
[1] UNIV MICHIGAN,DEPT ELECT ENGN & COMP SCI,SOLID STATE ELECTR LAB,ANN ARBOR,MI 48109
[2] MEIJI UNIV,DEPT COMP SCI,TAMA KU,KAWASAKI 214,JAPAN
关键词
Ionization - Mathematical models - Monte Carlo methods - Semiconducting gallium arsenide - Semiconducting indium compounds - Semiconductor junctions;
D O I
10.1109/16.249416
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The breakdown and speed characteristics of InP/InGaAs single and double HBT's are presented. Temperature-dependent two- and three-terminal measurements suggest that avalanche impact ionization is the dominant breakdown mechanism in InGaAs collector HBT's. Monte Carlo techniques and 1D drift-diffusion modeling are used for speed and breakdown simulation, respectively. Special doping profiles are evaluated for improving the breakdown-speed characteristics of single HBT's (SHBT's) with conventional uniformly doped InGaAs collectors. Double HBT's (DHBT's) outperform all SHBT's in terms of speed-breakdown tradeoffs as long as they use graded base-collector junctions or they operate under sufficiently high collector-emitter voltage conditions. A cutoff frequency of 200 GHz was found to be feasible with graded DHBT's and breakdown voltages up to 4.6 V were evaluated with 3000-angstrom-thick collector. Nongraded DHBT's can be optimized to perform better in terms of speed-breakdown tradeoffs provided that a high collector doping is used.
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页码:2 / 8
页数:7
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