USE OF ULTRA-LOW-ENERGY BF-2+ IMPLANTATION AND RAPID ANNEALING TO AVOID CHANNELING EFFECTS IN SHALLOW JUNCTION FORMATION

被引：7

作者：

FELCH, SB

POWELL, RA

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 21卷 / 2-4期

关键词：

D O I：

10.1016/0168-583X(87)90885-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：486 / 489

页数：4

相关论文

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