ENHANCED CRYSTALLINITY OF SILICON FILMS DEPOSITED BY CVD ON LIQUID LAYERS (CVDOLL PROCESS) - SILICON ON TIN LAYERS IN PRESENCE OF HYDROGEN-CHLORIDE

被引：20

作者：

GRAEF, MWM ^{[1
]}

GILING, LJ ^{[1
]}

BLOEM, J ^{[1
]}

机构：

[1] CATHOLIC UNIV NIJMEGEN,MAT SOLID STATE CHEM,RES INST,NIJMEGEN,NETHERLANDS

来源：

关键词：

D O I：

10.1063/1.324268

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3937 / 3940

页数：4

共 9 条

[1]

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CHU, TL ;

MOLLENKOPF, HC ;

CHU, SSC .

[4] POLYCRYSTALLINE SILICON ON COATED STEEL SUBSTRATES [J].

CHU, TL ;

MOLLENKOPF, HC ;

CHU, SS .

[5]

JENKINS MW, 1976, P S ETCHING PATTERN, P63

[6]

RASMANIS E, 1962, AF3365710438 CONTR

[7]

Sirtl E., 1969, Semiconductor silicon, P189

[8]

VANDENBREKEL CHJ, 1977, PHILIPS RES REP, V32, P134

WOLF, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (05) :984-999