CO2-LASER CLEANING OF BLACK DEPOSITS FORMED DURING THE EXCIMER LASER ETCHING OF POLYIMIDE IN AIR

被引：14

作者：

KOREN, G ^{[1
]}

DONELON, JJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY | 1988年 / 45卷 / 01期

关键词：

D O I：

10.1007/BF00692340

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：45 / 46

页数：2

共 6 条

[1] PULSED CO2-LASER ETCHING OF POLYIMIDE [J].

BRANNON, JH ;

LANKARD, JR .

[2] EXCIMER LASER ETCHING OF POLYIMIDE [J].

BRANNON, JH ;

LANKARD, JR ;

BAISE, AI ;

BURNS, F ;

KAUFMAN, J .

[3] CO2-LASER ASSISTED UV ABLATIVE PHOTOETCHING OF KAPTON FILMS [J].

KOREN, G .

[4] LASER ABLATION OF POLYMERS IN PRESSURIZED GAS AMBIENTS [J].

KOREN, G ;

OPPENHEIM, UP .

APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1987, 42 (01) :41-43

[5]

KOREN G, 1987, APPL PHYS LETT, V51

[6]

SRINIVASAN R, UNPUB ULTRAVIOLET LA