PULSED CO2-LASER ETCHING OF POLYIMIDE

被引：78

作者：

BRANNON, JH

LANKARD, JR

机构：

来源：

APPLIED PHYSICS LETTERS | 1986年 / 48卷 / 18期

关键词：

D O I：

10.1063/1.96989

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：1226 / 1228

页数：3

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共 8 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER
ANDREW, JE
DYER, PE
FORSTER, D
KEY, PH
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719
[2] EXCIMER LASER ETCHING OF POLYIMIDE
BRANNON, JH
LANKARD, JR
BAISE, AI
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[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043
[3] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS
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SIDHU, J
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) : 1420 - 1422
[4] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS
GORODETSKY, G
KAZYAKA, TG
MELCHER, RL
SRINIVASAN, R
[J]. APPLIED PHYSICS LETTERS, 1985, 46 (09) : 828 - 830
[5] EMISSION-SPECTRA AND ETCHING OF POLYMERS AND GRAPHITE IRRADIATED BY EXCIMER LASERS
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YEH, JTC
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (07) : 2120 - 2126
[6] CO2-LASER ASSISTED UV ABLATIVE PHOTOETCHING OF KAPTON FILMS
KOREN, G
[J]. APPLIED PHYSICS LETTERS, 1984, 45 (01) : 10 - 12
[7] ABLATIVE PHOTODECOMPOSITION OF POLYMER-FILMS BY PULSED FAR-ULTRAVIOLET (193 NM) LASER-RADIATION - DEPENDENCE OF ETCH DEPTH ON EXPERIMENTAL CONDITIONS
SRINIVASAN, R
BRAREN, B
[J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1984, 22 (10) : 2601 - 2609
[8] KINETICS OF THE ABLATIVE PHOTO-DECOMPOSITION OF ORGANIC POLYMERS IN THE FAR ULTRAVIOLET (193 NM)
SRINIVASAN, R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 923 - 926