STRESS-INDUCED ALIGNMENT OF ANISOTROPIC DEFECTS IN CRYSTALS

被引:13
作者
CORBETT, JW
WATKINS, GD
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D O I
10.1016/0022-3697(61)90021-X
中图分类号
O6 [化学];
学科分类号
0703 ;
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页码:319 / 320
页数:2
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[1]  
ARKANGELSKAYA VA, 1958, OPT SPEKTROSK, V4, P602
[2]  
Corbett J. P., UNPUB
[3]   DEFECTS IN IRRADIATED SILICON .2. INFRARED ABSSORPTION OF SI-A CENTER [J].
CORBETT, JW ;
WATKINS, GD ;
CHRENKO, RM ;
MCDONALD, RS .
PHYSICAL REVIEW, 1961, 121 (04) :1015-&
[4]  
DASH WC, COMMUNICATION
[5]  
FEOFILOV PP, 1953, DOKL AKAD NAUK SSSR+, V92, P743
[6]  
FEOFILOV PP, 1953, DOKL AKAD NAUK SSSR+, V92, P545
[7]  
HERZBERG G, 1945, INFRARED RAMAN SPECT, P168
[8]   THE SOLUBILITY OF OXYGEN IN SILICON [J].
HROSTOWSKI, HJ ;
KAISER, RH .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1959, 9 (3-4) :214-216
[9]   INFRARED ABSORPTION OF OXYGEN IN SILICON [J].
HROSTOWSKI, HJ ;
KAISER, RH .
PHYSICAL REVIEW, 1957, 107 (04) :966-972
[10]   EVIDENCE FOR INTERNAL ROTATION IN THE FINE STRUCTURE OF THE INFRARED ABSORPTION OF OXYGEN IN SILICON [J].
HROSTOWSKI, HJ ;
ALDER, BJ .
JOURNAL OF CHEMICAL PHYSICS, 1960, 33 (04) :980-990