DETECTION OF AL AND MG CONTAMINATION IN SPUTTERED PT FILMS BY AUGER-ELECTRON SPECTROSCOPY AND SECONDARY ION MASS-SPECTROMETRY

被引:5
作者
ANDREWS, JM
MORABITO, JM
机构
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
[2] BELL TEL LABS INC,ALLENTOWN,PA 18103
关键词
D O I
10.1016/0040-6090(76)90606-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:357 / 372
页数:16
相关论文
共 31 条
[1]  
ANDERSEN N, 1974, MAT FYS MEDD DAN VID, V39, P1
[2]  
ANDREWS JM, 1975, 147TH EL SOC M TOR, V75, P410
[3]  
ANDREWS JM, UNPUBLISHED
[4]  
Carter G., 1968, ION BOMBARDMENT SOLI
[5]  
DAHLGREN SD, 1972, J APPL PHYS, V43, P1514, DOI 10.1063/1.1661352
[6]   PLATINUM SILICIDE FORMATION - ELECTRON-SPECTROSCOPY OF PLATINUM-PLATINUM SILICIDE INTERFACE [J].
DANYLUK, S ;
MCGUIRE, GE .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (12) :5141-5144
[7]  
ELLIOTT RP, 1965, CONSTITUTION BINA S1
[8]  
FRITZINGER LB, UNPUBLISHED
[9]   METAL PRECIPITATES IN SILICON P-N JUNCTIONS [J].
GOETZBERGER, A ;
SHOCKLEY, W .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (10) :1821-1824
[10]  
GUTHRIE A, 1963, VACUUM TECHNOLOGY, P92