EFFECT OF THE SPUTTERING AMBIENT CONTAMINATION ON THE MICROSTRUCTURE OF AL-SI FILMS

被引:17
作者
QUEIROLO, G
DELLAGIOVANNA, M
DESANTI, G
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词
D O I
10.1116/1.575860
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
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页码:651 / 655
页数:5
相关论文
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