A STUDY OF CO2 AND EXCIMER LASER TREATMENTS OF POLY(ETHERETHERKETONE)

被引：3

作者：

OCCHIELLO, E ^{[1
]}

GARBASSI, F ^{[1
]}

MALATESTA, V ^{[1
]}

机构：

[1] FARMITALIA CARLO ERBA,DEPT RES & DEV,I-20146 MILANO,ITALY

来源：

ANGEWANDTE MAKROMOLEKULARE CHEMIE | 1989年 / 169卷

关键词：

D O I：

10.1002/apmc.1989.051690113

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：143 / 151

页数：9

共 16 条

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OSBORN, BN .

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[3]

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[5] WAVELENGTH DEPENDENCE OF THE EXCIMER LASER ETCHING CHARACTERISTICS OF A POLYMERIC RESIST [J].

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[6] DEVELOPMENT AND ORIGIN OF CONICAL STRUCTURES ON XECL LASER ABLATED POLYIMIDE [J].

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[7]

JELLINEK HHG, 1984, J PHYS CHEM-US, V88, P3048, DOI 10.1021/j150658a024

[8] CO2-LASER ASSISTED UV ABLATIVE PHOTOETCHING OF KAPTON FILMS [J].

KOREN, G .

APPLIED PHYSICS LETTERS, 1984, 45 (01) :10-12

[9] SURFACE-PROPERTIES OF POLY(ETHYLENE-TEREPHTHALATE) FILMS MODIFIED BY FAR-ULTRAVIOLET RADIATION AT 193-NM (LASER) AND 185-NM (LOW INTENSITY) [J].

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[10]

MALATESTA V, 1986, NOV P INT C LAS 86 O

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