WAVELENGTH DEPENDENCE OF THE EXCIMER LASER ETCHING CHARACTERISTICS OF A POLYMERIC RESIST

被引：13

作者：

DAVIS, GM ^{[1
]}

GOWER, MC ^{[1
]}

机构：

[1] UNIV OXFORD,CLARENDON LAB,OXFORD OX1 3PU,ENGLAND

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 18期

关键词：

D O I：

10.1063/1.97886

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1286 / 1288

页数：3

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