ALUMINUM SPUTTER ETCHING USING SICL4

被引:5
作者
DEGENKOLB, EO
机构
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D O I
10.1149/1.2124045
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1150 / 1151
页数:2
相关论文
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MIZUTANI T, 1981, NEW AL PLASMA ETCHIN
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