共 6 条
[1]
HERB GK, 1982, PLASMA PROCESSING
[4]
MIZUTANI T, 1981, NEW AL PLASMA ETCHIN
[5]
REACTIVE ION ETCHING OF ALUMINUM USING SICL4
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1982, 20 (02)
:186-190
[6]
REACTIVE ION ETCHING OF ALUMINUM AND ALUMINUM-ALLOYS IN AN RF PLASMA CONTAINING HALOGEN SPECIES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978, 15 (02)
:334-337