THIN-FILM STRUCTURE TO REDUCE RADIATION-DAMAGE IN X-RAY-LITHOGRAPHY

[1] COTTON, 1966, ADV INORGANIC CHEM

[2] SPURIOUS EFFECTS CAUSED BY CONTINUOUS RADIATION AND EJECTED ELECTRONS IN X-RAY LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1329 - 1331

[3] MALDONADO JR, 1986, J ELECTROCHEM SOC

[4] HIGH-RESOLUTION PATTERN DEFINITION IN TUNGSTEN [J]. APPLIED PHYSICS LETTERS, 1981, 39 (09) : 742 - 743

[5] REISMAN A, 1984, J ELECTROCHEM SOC, V131

[6] REISMAN A, 1981, J ELECTROCHEM SOC, V128

[7] REACTIVE-ION ETCHING OF 0.2-MU-M PERIOD GRATINGS IN TUNGSTEN AND MOLYBDENUM USING CBRF3 [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 272 - 275

[8] SHIMAYA M, 1984, J ELECTROCHEM SOC, V131

[9] SUN JY, 1986, AUG INT C SOL STAT D

[10] TANG CC, 1984, J ELECTROCHEM SOC, V131

[1] COTTON, 1966, ADV INORGANIC CHEM

[2] SPURIOUS EFFECTS CAUSED BY CONTINUOUS RADIATION AND EJECTED ELECTRONS IN X-RAY LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1329 - 1331

[3] MALDONADO JR, 1986, J ELECTROCHEM SOC

[4] HIGH-RESOLUTION PATTERN DEFINITION IN TUNGSTEN [J]. APPLIED PHYSICS LETTERS, 1981, 39 (09) : 742 - 743

[5] REISMAN A, 1984, J ELECTROCHEM SOC, V131

[6] REISMAN A, 1981, J ELECTROCHEM SOC, V128

[7] REACTIVE-ION ETCHING OF 0.2-MU-M PERIOD GRATINGS IN TUNGSTEN AND MOLYBDENUM USING CBRF3 [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 272 - 275

[8] SHIMAYA M, 1984, J ELECTROCHEM SOC, V131

[9] SUN JY, 1986, AUG INT C SOL STAT D

[10] TANG CC, 1984, J ELECTROCHEM SOC, V131