AES INVESTIGATIONS OF AR+ ION RETENTION IN SI DURING AR SPUTTERING

被引:11
作者
KEMPF, J
机构
来源
APPLIED PHYSICS | 1978年 / 16卷 / 01期
关键词
D O I
10.1007/BF00931420
中图分类号
O59 [应用物理学];
学科分类号
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页码:43 / 46
页数:4
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