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ADHESION ENHANCEMENT BY MEV ION IRRADIATION

被引：17
作者：
INGEMARSSON, PA
机构：
[1] UNIV UPPSALA,DEPT MAT SCI,S-75121 UPPSALA,SWEDEN
[2] UNIV UPPSALA,DEPT RADIAT SCI,S-75121 UPPSALA,SWEDEN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1990年 / 44卷 / 04期
关键词：
85;
D O I：
10.1016/0168-583X(90)90005-F
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The ability of energetic ion beams to enhance the strength of thin film interfaces is a well-established phenomenon. Both the adhesion as such and its ability to improve depend on the nature of the film and substrate. In the case of metal-Teflon interfaces, radiation induced toughening of the Teflon surface appears to be crucial to adhesion, whilst the bonding of metal films to ceramic surfaces seems to depend on the interface chemistry. The aim of this paper is to review some of the recent results in this field. © 1990.
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收藏
页码：437 / 444
页数：8
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