INTERFACE TAILORING FOR ADHESION USING ION-BEAMS

被引：23

作者：

BAGLIN, JEE

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(89)90892-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：764 / 768

页数：5

共 13 条

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[3] ION INDUCED ADHESION VIA INTERFACIAL COMPOUNDS [J].

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TU, KN ;

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NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :782-786

[4]

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[5]

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[6]

BOTTIGER J, 1984, P MATER RES SOC, V25, P203

[7] MOSSBAUER AND ADHESION STUDY OF H+ IMPLANTED IRON FILMS ON INSULATORS [J].

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BATTAGLIN, G ;

MAZZOLDI, P ;

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RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1986, 98 (1-4) :21-26

[8] ENHANCED CU-TEFLON ADHESION BY PRESPUTTERING PRIOR TO THE CU DEPOSITION [J].

CHANG, CA ;

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SCHROTT, AG ;

LIN, KC .

APPLIED PHYSICS LETTERS, 1987, 51 (02) :103-105

[9]

Harper J.M.E., 1984, ION BOMBARDMENT MODI

[10] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS [J].

HARPER, JME ;

CUOMO, JJ ;

KAUFMAN, HR .

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