PHOTOREFLECTANCE SURFACE FERMI LEVEL MEASUREMENTS OF GAAS SUBJECTED TO VARIOUS CHEMICAL TREATMENTS

被引：45

作者：

GASKILL, DK

BOTTKA, N

SILLMON, RS

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 05期

关键词：

D O I：

10.1116/1.584202

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：1497 / 1501

页数：5

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