UNPINNED (100) GAAS-SURFACES IN AIR USING PHOTOCHEMISTRY

被引:199
作者
OFFSEY, SD [1 ]
WOODALL, JM [1 ]
WARREN, AC [1 ]
KIRCHNER, PD [1 ]
CHAPPELL, TI [1 ]
PETTIT, GD [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
PHOTOLUMINESCENCE - SEMICONDUCTOR DEVICES; MIS;
D O I
10.1063/1.96535
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have unpinned the Fermi level at the surface of both n- and p-type (100) GaAs in air. Light-induced photochemistry between GaAs and water unpins the surface Fermi level by reducing the surface state density. Excitation photoluminescence spectroscopy shows a substantial decrease in both surface band bending and surface recombination velocity in treated samples, consistent with a greatly reduced surface state density ( approximately equals 10**1**1 cm**-**2). Capacitance-voltage measurements on metal-insulator-semiconductor structures corroborate this reduction in surface state density and show that the band bending may be controlled externally, indicating an unpinned Fermi level at the insulator/GaAs interface. We discuss a possible unpinning mechanism.
引用
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页码:475 / 477
页数:3
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