IONIZED-CLUSTER BEAM EPITAXY

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (07) : 2953 - +

[2] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .2. PB+ ION-BEAM DEPOSITION AND ANALYSIS OF DEPOSITS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (03): : 831 - 835

[3] EFFECT OF ION IRRADIATION ON FORMATION, STRUCTURE AND PROPERTIES OF THIN METAL-FILMS [J]. THIN SOLID FILMS, 1976, 38 (01) : 1 - 8

[4] FLYNT WE, 1961, 3RD P S EL BEAM TECH, P368

[5] OXIDATION OF LEAD BY LOW-ENERGY O2+ BOMBARDMENT [J]. SURFACE SCIENCE, 1972, 32 (01) : 222 - &

[6] Maissel L. I., 1970, HDB THIN FILM TECHNO, P8

[7] MATSUBARA K, 1978, ICVGE4

[8] MURAYAMA Y, 1977, P S ION SOURCE APPL, P113

[9] PROBYN BA, 1968, BRIT J APPL PHYS, P457

[10] IONIZED-CLUSTER BEAM DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1128 - 1134

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (07) : 2953 - +

[2] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .2. PB+ ION-BEAM DEPOSITION AND ANALYSIS OF DEPOSITS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (03): : 831 - 835

[3] EFFECT OF ION IRRADIATION ON FORMATION, STRUCTURE AND PROPERTIES OF THIN METAL-FILMS [J]. THIN SOLID FILMS, 1976, 38 (01) : 1 - 8

[4] FLYNT WE, 1961, 3RD P S EL BEAM TECH, P368

[5] OXIDATION OF LEAD BY LOW-ENERGY O2+ BOMBARDMENT [J]. SURFACE SCIENCE, 1972, 32 (01) : 222 - &

[6] Maissel L. I., 1970, HDB THIN FILM TECHNO, P8

[7] MATSUBARA K, 1978, ICVGE4

[8] MURAYAMA Y, 1977, P S ION SOURCE APPL, P113

[9] PROBYN BA, 1968, BRIT J APPL PHYS, P457

[10] IONIZED-CLUSTER BEAM DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1128 - 1134