A-SI-H PRODUCED BY HIGH-TEMPERATURE THERMAL-DECOMPOSITION OF SILANE

被引：119

作者：

WIESMANN, H

GHOSH, AK

MCMAHON, T

STRONGIN, M

机构：

[1] Brookhaven National Laboratory, Upton

来源：

JOURNAL OF APPLIED PHYSICS | 1979年 / 50卷 / 05期

关键词：

D O I：

10.1063/1.326284

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Hydrogenated amorphous silicon has been deposited by a new technique of thermal decomposition of silane from a hot tungsten or carbon foil heated to about 1600 °C. Initial measurements indicate that the resulting films have a fairly high photoresponse. Introduction of ammonia along with silane is seen to enhance the photoconductivity quite significantly.

引用

页码：3752 / 3754

页数：3

共 4 条

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PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1978, 37 (03) :403-407

[2]

HUGNESS T, 1936, J AM CHEM SOC, V58, P108

[3] SOME PROPERTIES OF EVAPORATED AMORPHOUS SILICON MADE WITH ATOMIC-HYDROGEN [J].

MILLER, DL ;

LUTZ, H ;

WIESMANN, H ;

ROCK, E ;

GHOSH, AK ;

RAMAMOORTHY, S ;

STRONGIN, M .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (12) :6192-6193

[4] OPTICAL AND PHOTOCONDUCTIVE PROPERTIES OF DISCHARGE-PRODUCED AMORPHOUS SILICON [J].

ZANZUCCHI, PJ ;

WRONSKI, CR ;

CARLSON, DE .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (12) :5227-5236

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