KINETICS AND MECHANISMS OF CW-LASER INDUCED DEPOSITION OF METALS FOR MICROELECTRONICS

被引：9

作者：

AUVERT, G

机构：

来源：

关键词：

D O I：

10.1016/0169-4332(89)90189-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：47 / 53

页数：7

共 28 条

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[J]. APPLIED PHYSICS LETTERS, 1988, 52 (22) : 1865 - 1867
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