LOW-TEMPERATURE DISINTEGRATION OF THIN SOLID FILMS

被引：8

作者：

MAZUR, VA

GOLDINER, MG

机构：

来源：

PHYSICS LETTERS A | 1989年 / 137卷 / 1-2期

关键词：

D O I：

10.1016/0375-9601(89)90973-0

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：69 / 74

页数：6

共 12 条

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[2]

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[3]

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[4]

GOLDINER MG, 1975, SOV SOLID STATE PHYS, V17, P1874

[5]

GOLDINER MG, 1978, SOV PHYS CHEM MATER, V4, P112

[6] HILLOCK GROWTH ON VACUUM-DEPOSITED ALUMINUM FILMS [J].

HERMAN, DS ;

SCHUSTER, MA ;

GERBER, RM .

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[7] STRESS RELIEF AND HILLOCK FORMATION IN THIN LEAD FILMS [J].

LAHIRI, SK .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (07) :3172-&

[8] REVERSIBLE HILLOCK GROWTH IN THIN FILMS [J].

LAHIRI, SK ;

WELLS, OC .

APPLIED PHYSICS LETTERS, 1969, 15 (07) :234-&

[9]

NOVIKOV VI, 1986, FIZ TVERD TELA+, V28, P1251

[10]

PADDOCK AD, 1968, J ELECTROCHEM SOC, V115, P700

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