HILLOCK GROWTH ON VACUUM-DEPOSITED ALUMINUM FILMS

被引：54

作者：

HERMAN, DS

SCHUSTER, MA

GERBER, RM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期

关键词：

D O I：

10.1116/1.1316673

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：515 / &

共 12 条

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[10] HILLOCK GROWTH AND STRESS RELIEF IN SPUTTERED AU FILMS [J].

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