IMPROVEMENTS IN LOW-FREQUENCY NOISE OF MOSFETS FOR FRONT END AMPLIFIERS

被引:7
作者
KANDIAH, K
机构
[1] Rutherford Appleton Laboratory, Chilton, Didcot, Oxon
关键词
D O I
10.1016/0168-9002(90)90480-T
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Studies of physical noise mechanisms in transistors show that a MOSFET in inversion will exhibit a 1 f{hook} noise spectrum proportional to the volumetric trap density in the oxide, inversely proportional to the gate area and independent of bias or temperature over the entire usable range. A depletion mode MOSFET at aroundroom temperature, owing to its 1 f{hook}2 spectrum, will shown an improvement over a limited range of frequencies which is related to the interface state density and the intrinsic carrier density in Si. At reduced temperatures depletion mode MOSFETs can be equal to the best JFETs but devices in CCDs and other similar applications do not yet demonstrate this potential. The noise performance of n and p channel devices in CMOS processes are compared. © 1990.
引用
收藏
页码:150 / 156
页数:7
相关论文
共 7 条
[1]  
Kandiah K., 1986, Noise in Physical Systems and 1/f Noise - 1985. Proceedings of the 8th International Conference on `Noise in Physical Systems' and the 4th International Conference on `1/f Noise', P19
[2]   A PHYSICAL MODEL FOR RANDOM TELEGRAPH SIGNAL CURRENTS IN SEMICONDUCTOR-DEVICES [J].
KANDIAH, K ;
DEIGHTON, MO ;
WHITING, FB .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (02) :937-948
[3]  
KANDIAH K, 1981, NBS PUBLICATION, V614, P75
[4]  
KANDIAH K, 1983, NOISE PHYSICAL SYSTE, P287
[5]  
MCWHORTER AL, 1956, SEMICONDUCTOR SURFAC, P219
[6]  
RADEKA V, 1908, ANNU REV NUCL PART S, P217
[7]   PROPERTIES OF SEMICONDUCTOR SURFACE INVERSION LAYERS IN ELECTRIC QUANTUM LIMIT [J].
STERN, F ;
HOWARD, WE .
PHYSICAL REVIEW, 1967, 163 (03) :816-&