NOVEL AUTOMATIC MEASURING SYSTEM FOR RESISTIVITY PROFILES IN SILICON-WAFERS

被引：6

作者：

KOMATSU, R

KAJIYAMA, K

NAKAMURA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 01期

关键词：

D O I：

10.1143/JJAP.19.169

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：169 / 173

页数：5

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