SOME CHARGE PHENOMENA IN D-C REACTIVELY SPUTTERED ALUMINA FILMS ON SILICON

被引：10

作者：

CHEN, MC

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1971年 / 118卷 / 04期

关键词：

D O I：

10.1149/1.2408118

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：591 / +

页数：1

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[1] DEPOSITION AND PROPERTIES OF ALUMINUM OXIDE OBTAINED BY PYROLYTIC DECOMPOSITION OF AN ALUMINUM ALKOXIDE
ABOAF, JA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) : 948 - &
[2] SI-SIO2 FAST INTERFACE STATE MEASUREMENTS
BROWN, DM
GRAY, PV
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (07) : 760 - +
[3] MEASUREMENTS OF ATTACHMENT OF LOW-ENERGY ELECTRONS TO OXYGEN MOLECULES
CHANIN, LM
PHELPS, AV
BIONDI, MA
[J]. PHYSICAL REVIEW, 1962, 128 (01): : 219 - &
[4] PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES
CHU, TL
SZEDON, JR
LEE, CH
[J]. SOLID-STATE ELECTRONICS, 1967, 10 (09) : 897 - &
[5] COBINE JD, 1941, GASEOUS CONDUCTORS
[6] THE ATTACHMENT OF SLOW ELECTRONS IN OXYGEN
CRAGGS, JD
THORBURN, R
TOZER, BA
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1957, 240 (1223): : 473 - 483
[7] ELECTRICAL PROPERTIES OF EVAPORATED ALUMINUM OXIDE FILMS
DASILVA, EM
WHITE, P
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (01) : 12 - 15
[8] CHARACTERISTICS OF FAST SURFACE STATES ASSOCIATED WITH SIO2-SI AND SI3N4-SIO2-SI STRUCTURES
DEAL, BE
MACKENNA, EL
CASTRO, PL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 997 - &
[9] PRELIMINARY INVESTIGATIONS OF REACTIVELY EVAPORATED ALUMINUM OXIDE FILMS ON SILICON
FERRIEU, E
PRUNIAUX, B
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1008 - +
[10] PHASE CHANGES IN THIN REACTIVELY SPUTTERED ALUMINA FILMS
FRIESER, RG
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (04) : 357 - &

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