PHYSICAL PROCESSES IN THE SUBSTRATE DARK SPACE IN BIASED DEPOSITION SYSTEMS

被引:10
作者
HURLEY, RE
机构
关键词
D O I
10.1016/0040-6090(81)90293-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:241 / 253
页数:13
相关论文
共 32 条
[21]   INCORPATION OF HELIUM IN DEPOSITED GOLD FILMS [J].
MATTOX, DM ;
KOMINIAK, GJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (01) :194-+
[22]  
MATTOX DM, 1979, 1979 P INT C ION PLA, P1
[23]   ENHANCED DIFFUSION IN SI AND GE BY LIGHT ION IMPLANTATION [J].
MINEAR, RL ;
GIBBONS, JF ;
NELSON, DG .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (08) :3468-&
[24]  
MOVCHAN BA, 1969, PHYS METALS METALLOG, V28, P83
[25]  
Nelson R. S., 1969, Radiation Effects, V2, P47, DOI 10.1080/00337576908235579
[26]  
NELSON RS, 1977, 1977 P INT C ION PLA, P32
[27]   ION BOMBARDMENT OF SILICON IN A GLOW DISCHARGE [J].
STRACK, H .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) :2405-&
[28]   ADHESION OF ION PLATED FILMS AND ENERGIES OF DEPOSITION [J].
TEER, DG .
JOURNAL OF ADHESION, 1977, 8 (04) :289-300
[29]   INFLUENCE OF SUBSTRATE TEMPERATURE AND DEPOSITION RATE ON STRUCTURE OF THICK SPUTTERED CU COATINGS [J].
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :830-835
[30]   INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS [J].
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :666-670