PULSED ELECTRON-BEAM LITHOGRAPHY IN SOFT VACUUM

被引：3

作者：

KRISHNASWAMY, J

LI, L

COLLINS, GJ

HIRAOKA, H

CAOLO, MA

机构：

[1] IBM CORP, ALMADEN RES CTR, SAN JOSE, CA 95120 USA

[2] HEWLETT PACKARD CO, FT COLLINS, CO 80525 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 01期

关键词：

D O I：

10.1116/1.584863

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：39 / 46

页数：8

共 36 条

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