PARAMETRIC MODELING AT RESIST-SUBSTRATE INTERFACES

被引:12
作者
OCOLA, LE [1 ]
CERRINA, F [1 ]
机构
[1] UNIV WISCONSIN,DEPT ELECT & COMP ENGN,MADISON,WI 53705
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期
关键词
D O I
10.1116/1.587415
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:3986 / 3989
页数:4
相关论文
共 13 条
[1]   MOLECULAR-WEIGHT DEPENDENCE OF DEVELOPED CONTOURS IN POLY-(METHYL METHACRYLATE) ELECTRON RESISTS [J].
ATODA, N ;
KOMURO, M ;
KAWAKATSU, H .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) :3707-3712
[2]   FABRICATION OF SUB-10 NM STRUCTURES BY LIFT-OFF AND BY ETCHING AFTER ELECTRON-BEAM EXPOSURE OF POLY(METHYLMETHACRYLATE) RESIST ON SOLID SUBSTRATES [J].
CHEN, W ;
AHMED, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2519-2523
[3]  
CHEN Y, 1994, J VAC SCI TECHNOL B, V12, P4013
[4]   REDUCTION AND ELIMINATION OF PROXIMITY EFFECTS [J].
DOBISZ, EA ;
MARRIAN, CRK ;
SALVINO, RE ;
ANCONA, MA ;
PERKINS, FK ;
TURNER, NH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2733-2740
[5]  
Early K., 1990, Microelectronic Engineering, V11, P317, DOI 10.1016/0167-9317(90)90122-A
[6]   DEVELOPER CHARACTERISTICS OF POLY-(METHYL METHACRYLATE) ELECTRON RESIST [J].
GREENEICH, JS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (07) :970-976
[7]   SIMULTANEOUS-OPTIMIZATION OF SPECTRUM, SPATIAL COHERENCE, GAP, FEATURE BIAS, AND ABSORBER THICKNESS IN SYNCHROTRON-BASED X-RAY-LITHOGRAPHY [J].
HECTOR, SD ;
SMITH, HI ;
SCHATTENBURG, ML .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2981-2985
[8]  
Henke B. L., 1982, Atomic Data and Nuclear Data Tables, V27, P1, DOI 10.1016/0092-640X(82)90002-X
[9]   UPDATED SYSTEM MODEL FOR X-RAY-LITHOGRAPHY [J].
KHAN, M ;
MOHAMMAD, L ;
XIAO, J ;
OCOLA, L ;
CERRINA, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06) :3930-3935
[10]   PARAMETRIC MODELING OF PHOTOELECTRON EFFECTS IN X-RAY-LITHOGRAPHY [J].
OCOLA, LE ;
CERRINA, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2839-2844