PREPARATION AND GAS-SENSING PROPERTIES OF ALPHA-FE2O3 THIN-FILMS

被引：24

作者：

CHAI, CC

PENG, J

YAN, BP

机构：

[1] Microelectronics Institute, Xidian University, Xi'an, 710071, Shaanxi

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1995年 / 24卷 / 07期

关键词：

ALPHA-FE2O3 THIN FILMS; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION (APCVD); GAS-SENSING PROPERTY; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

D O I：

10.1007/BF02653327

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Haematite (alpha-Fe2O3) thin films are prepared by two different chemical vapor deposition (CVD) processes: the atmospheric pressure CVD (APCVD) and the plasma enhanced CVD (PECVD). The films are analyzed by x-ray diffraction and scanning electron microscopy; their gas-sensing properties are also investigated. Experimental results show that APCVD alpha-Fe2O3 films are highly sensitive and selective to smoke while PECVD films are highly sensitive and selective to alcohol. A certain amount of quadrivalent metal in the films has an effect on their sensitivity and selectivity to gases. It is found that the films will ''break down'' under certain conditions.

引用

页码：799 / 804

页数：6

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