MICROSTRUCTURE, GROWTH, RESISTIVITY, AND STRESSES IN THIN TUNGSTEN FILMS DEPOSITED BY RF SPUTTERING

被引：212

作者：

PETROFF, P ^{[1
]}

SHENG, TT ^{[1
]}

SINHA, AK ^{[1
]}

ROZGONYI, GA ^{[1
]}

ALEXANDER, FB ^{[1
]}

机构：

[1] BELL LABS, MURRAY HILL, NJ 07974 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 06期

关键词：

D O I：

10.1063/1.1662611

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2545 / 2554

页数：10

共 16 条

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BASAVAIAH, S ;

POLLACK, SR .

APPLIED PHYSICS LETTERS, 1968, 12 (08) :259-+

[2] SUPERCONDUCTIVITY IN BETA-TUNGSTEN FILMS [J].

BASAVAIAH, S ;

POLLACK, SR .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) :5548-+

[3]

CHANG CC, TO BE PUBLISHED

[4]

EHRLICH G, 1965, STRUCTURE PROPERTIES

[5]

GEUS JW, 1971, CHEMISORPTION REACTI, V1

[6] HIGH RESISTIVITY OF DC-SPUTTERED METAL FILMS [J].

LEE, WWY .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (11) :4366-&

[7] RESISTIVITY AND STRUCTURE OF EVAPORATED ALUMINUM FILMS [J].

MAYADAS, AF ;

FEDER, R ;

ROSENBERG, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :690-+

[8] UBER DIE BILDUNGSBEDINGUNGEN UND EIGENSCHAFTEN DES BETA-WOLFRAMS - WEITERER BEITRAG ZUR REDUKTION DES WOLFRAMTRIOXYDS [J].

MILLNER, T ;

HEGEDUS, AJ ;

SASVARI, K ;

NEUGEBAUER, J .

ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1957, 289 (5-6) :288-312

[9]

ROZGONYI GA, TO BE PUBLISHED

[10]

SHENG TT, TO BE PUBLISHED

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