SUBMICROMETER LIFT-OFF LINE WITH T-SHAPED CROSS-SECTIONAL FORM

[1] GROBMAN WD, 1978, IEDM WASHINGTON, P58

[2] SUBMICROMETER GATE FABRICATION OF GAAS MESFET BY PLASMA ETCHING [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) : 1213 - 1218

[3] DOUBLE-LAYER RESIST FILMS FOR SUBMICROMETER ELECTRON-BEAM LITHOGRAPHY [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) : 1443 - 1448

[1] GROBMAN WD, 1978, IEDM WASHINGTON, P58

[2] SUBMICROMETER GATE FABRICATION OF GAAS MESFET BY PLASMA ETCHING [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) : 1213 - 1218

[3] DOUBLE-LAYER RESIST FILMS FOR SUBMICROMETER ELECTRON-BEAM LITHOGRAPHY [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) : 1443 - 1448