MOLECULAR-BEAM STUDY OF LASER-INDUCED CHEMICAL ETCHING OF SI(111) BY CHLORINE MOLECULES

被引：10

作者：

LI, YL

ZHANG, ZJ

ZHENG, QK

JIN, ZK

WU, ZK

QIN, QZ

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 20期

关键词：

D O I：

10.1063/1.100334

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1955 / 1957

页数：3

共 15 条

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[7] LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE .1. PULSED IRRADIATION [J].

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[8] PHOTO-EXCITED ETCHING OF POLYCRYSTALLINE AND SINGLE-CRYSTALLINE SILICON IN CL2 ATMOSPHERE [J].

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[9]

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[10]

READY JF, 1971, EFFECTS HIGH POWER L

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