PHOTO-EXCITED ETCHING OF POLYCRYSTALLINE AND SINGLE-CRYSTALLINE SILICON IN CL2 ATMOSPHERE

被引：70

作者：

OKANO, H

HORIIKE, Y

SEKINE, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1985年 / 24卷 / 01期

关键词：

D O I：

10.1143/JJAP.24.68

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：68 / 74

页数：7

共 32 条

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