THERMAL NOISE, DIFFUSION, AND THE MOBILITY OF HOT HOLES IN SILICON

被引：2

作者：

BOSMAN, G

ZIJLSTRA, RJJ

机构：

来源：

PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 1982年 / 109卷 / 02期

关键词：

D O I：

10.1002/pssb.2221090227

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：683 / 691

页数：9

共 16 条

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[8]

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[9] HOLE DRIFT VELOCITY IN SILICON [J].

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