PROCESS EFFECTS IN ION PLATING

被引：25

作者：

FANCEY, KS

MATTHEWS, A

机构：

[1] Department of Engineering Design and Manufacture, University of Hull, Hull

来源：

VACUUM | 1990年 / 41卷 / 7-9期

关键词：

D O I：

10.1016/0042-207X(90)94223-D

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

By the use of Optical Emission Spectroscopy and cathode sheath thickness measurements in ion plating discharges, we have (i) identified the influence of ionisation intensification sources on plasma spatial distribution, (ii) shown that nitrogen dissociative charge exchange in the sheath may be significant under certain conditions, and (iii) found evidence for the possible presence of metal clusters in the discharge. The implications of these findings are discussed.

引用

页码：2196 / 2200

页数：5

共 14 条

[1] ION SAMPLING CONSIDERATIONS FOR A DISCHARGE PLASMA OF NITROGEN [J].