ENERGY RESOLVED ANGULAR-DISTRIBUTION OF ARGON IONS AT THE SUBSTRATE PLANE OF A RADIO-FREQUENCY PLASMA REACTOR

被引:30
作者
JANES, J
HUTH, C
机构
[1] Fraunhofer-Institut für Mikrostrukturtechnik, 1000 Berlin 33
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 06期
关键词
D O I
10.1116/1.577779
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The energy resolved angular distributions of argon ions of a 13.56 MHz rf discharge bombarding the powered electrode in a parallel plate reactor are investigated. Argon ions from the plasma are sampled through a small orifice in the powered cathode and are analyzed using a quadrupole mass spectrometer equipped with an energy filter. The angular resolution of the instrument is slightly better than 1-degrees. The process pressure ranges from 5 to 50 mTorr and the rf power is varied to yield dc bias potentials between - 100 and - 450 V. The measured energy distributions of argon ions extend from 0 eV up to a maximal energy corresponding to the dc bias potential and exhibit significant structures which are explained by the effect of collisions in the sheath combined with rf modulations of the sheath potential. The principle structures in the ion energy distributions are nearly independent from the angle of ion trajectories with respect to the electrode normal. The energy resolved ion angular distributions are investigated in the range between +/- 3-degrees and show structures which may be resulting from charge exchange collisions and elastic scattering of ions in the sheath. Angular distributions centered around the surface normal are found with angular widths between 1-degrees and 2-degrees. Furthermore, extrema at angles between 1-degrees and 2-degrees are detected for distinct energies and plasma parameters.
引用
收藏
页码:3522 / 3531
页数:10
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