PHOSPHORUS DIFFUSION INTO SILICON FROM CHEMICALLY VAPOUR-DEPOSITED PHOSPHOSILICATE GLASS

被引：6

作者：

CEROFOLINI, GF

POLIGNANO, ML

PICCO, P

FINETTI, M

SOLMI, S

GALLORINI, M

机构：

[1] CNR,IST LAMEL,I-40126 BOLOGNA,ITALY

[2] CNR,CTR RADIOCHEM & ACTIVAT ANAL,PAVIA,ITALY

来源：

THIN SOLID FILMS | 1982年 / 87卷 / 04期

关键词：

D O I：

10.1016/0040-6090(82)90290-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：373 / 378

页数：6

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