FEATURES OF AND INSITU MEASUREMENTS ON ABSORBING TIOX FILMS PRODUCED BY REACTIVE DC MAGNETRON-PLASMATRON SPUTTERING

被引：41

作者：

SCHILLER, S

BEISTER, G

SCHNEIDER, S

SIEBER, W

机构：

来源：

THIN SOLID FILMS | 1980年 / 72卷 / 03期

关键词：

D O I：

10.1016/0040-6090(80)90534-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：475 / 483

页数：9

共 24 条

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