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EFFECT OF OXYGEN ON ELECTRICAL AND STURCTURAL PROPERTIES OF TRIODE-SPUTTERED TANTALUM FILMS
被引:21
作者
:
WATERHOU.N
论文数:
0
引用数:
0
h-index:
0
WATERHOU.N
WILCOX, PS
论文数:
0
引用数:
0
h-index:
0
WILCOX, PS
WILLMOTT, DJ
论文数:
0
引用数:
0
h-index:
0
WILLMOTT, DJ
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1971年
/ 42卷
/ 13期
关键词
:
D O I
:
10.1063/1.1659995
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:5649 / &
相关论文
共 20 条
[1]
PROPERTIES OF SUPERCONDUCTING NIOBIUM FILMS MADE BY ASYMMETRIC AC SPUTTERING
[J].
FRERICHS, R
论文数:
0
引用数:
0
h-index:
0
FRERICHS, R
;
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
KIRCHER, CJ
.
JOURNAL OF APPLIED PHYSICS,
1963,
34
(12)
:3541
-&
[2]
SUPERCONDUCTIVE FILMS MADE BY PROTECTED SPUTTERING OF TANTALUM OR NIOBIUM
[J].
FRERICHS, R
论文数:
0
引用数:
0
h-index:
0
FRERICHS, R
.
JOURNAL OF APPLIED PHYSICS,
1962,
33
(05)
:1898
-&
[3]
A HIGH CURRENT VACUUM DISCHARGE FOR TRIODE-SPUTTERING IN 10-4 TORR RANGE
[J].
GAYDOU, FP
论文数:
0
引用数:
0
h-index:
0
GAYDOU, FP
.
VACUUM,
1967,
17
(06)
:325
-&
[4]
EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS
[J].
GERSTENBERG, D
论文数:
0
引用数:
0
h-index:
0
GERSTENBERG, D
;
CALBICK, CJ
论文数:
0
引用数:
0
h-index:
0
CALBICK, CJ
.
JOURNAL OF APPLIED PHYSICS,
1964,
35
(02)
:402
-&
[5]
PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM
[J].
GERSTENBERG, D
论文数:
0
引用数:
0
h-index:
0
GERSTENBERG, D
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1966,
113
(06)
:542
-+
[6]
The Mechanism of Reactive Sputtering
[J].
Hollands, E.
论文数:
0
引用数:
0
h-index:
0
机构:
Plessey Co Ltd, Allen Clark Res Ctr, Towcester, Northants, England
Plessey Co Ltd, Allen Clark Res Ctr, Towcester, Northants, England
Hollands, E.
;
Campbell, D. S.
论文数:
0
引用数:
0
h-index:
0
机构:
Plessey Co Ltd, Allen Clark Res Ctr, Towcester, Northants, England
Plessey Co Ltd, Allen Clark Res Ctr, Towcester, Northants, England
Campbell, D. S.
.
JOURNAL OF MATERIALS SCIENCE,
1968,
3
(05)
:544
-552
[7]
DEPOSITION OF TANTALUM TANTALUM OXIDE AND TANTALUM NITRIDE WITH CONTROLLED ELECTRICAL CHARACTERISTICS
[J].
KRIKORIAN, E
论文数:
0
引用数:
0
h-index:
0
KRIKORIAN, E
;
SNEED, RJ
论文数:
0
引用数:
0
h-index:
0
SNEED, RJ
.
JOURNAL OF APPLIED PHYSICS,
1966,
37
(10)
:3674
-+
[8]
ELECTRICAL AND STRUCTURAL PROPERTIES OF EPITAXIAL BCC TANTALUM FILMS
[J].
MARCUS, RB
论文数:
0
引用数:
0
h-index:
0
MARCUS, RB
.
JOURNAL OF APPLIED PHYSICS,
1966,
37
(08)
:3121
-&
[9]
A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E)
[J].
READ, MH
论文数:
0
引用数:
0
h-index:
0
READ, MH
;
ALTMAN, C
论文数:
0
引用数:
0
h-index:
0
ALTMAN, C
.
APPLIED PHYSICS LETTERS,
1965,
7
(03)
:51
-&
[10]
SCHNEIDER HG, 1968, WISS Z TH ILMENAU, V14, P165
←
1
2
→
共 20 条
[1]
PROPERTIES OF SUPERCONDUCTING NIOBIUM FILMS MADE BY ASYMMETRIC AC SPUTTERING
[J].
FRERICHS, R
论文数:
0
引用数:
0
h-index:
0
FRERICHS, R
;
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
KIRCHER, CJ
.
JOURNAL OF APPLIED PHYSICS,
1963,
34
(12)
:3541
-&
[2]
SUPERCONDUCTIVE FILMS MADE BY PROTECTED SPUTTERING OF TANTALUM OR NIOBIUM
[J].
FRERICHS, R
论文数:
0
引用数:
0
h-index:
0
FRERICHS, R
.
JOURNAL OF APPLIED PHYSICS,
1962,
33
(05)
:1898
-&
[3]
A HIGH CURRENT VACUUM DISCHARGE FOR TRIODE-SPUTTERING IN 10-4 TORR RANGE
[J].
GAYDOU, FP
论文数:
0
引用数:
0
h-index:
0
GAYDOU, FP
.
VACUUM,
1967,
17
(06)
:325
-&
[4]
EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS
[J].
GERSTENBERG, D
论文数:
0
引用数:
0
h-index:
0
GERSTENBERG, D
;
CALBICK, CJ
论文数:
0
引用数:
0
h-index:
0
CALBICK, CJ
.
JOURNAL OF APPLIED PHYSICS,
1964,
35
(02)
:402
-&
[5]
PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM
[J].
GERSTENBERG, D
论文数:
0
引用数:
0
h-index:
0
GERSTENBERG, D
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1966,
113
(06)
:542
-+
[6]
The Mechanism of Reactive Sputtering
[J].
Hollands, E.
论文数:
0
引用数:
0
h-index:
0
机构:
Plessey Co Ltd, Allen Clark Res Ctr, Towcester, Northants, England
Plessey Co Ltd, Allen Clark Res Ctr, Towcester, Northants, England
Hollands, E.
;
Campbell, D. S.
论文数:
0
引用数:
0
h-index:
0
机构:
Plessey Co Ltd, Allen Clark Res Ctr, Towcester, Northants, England
Plessey Co Ltd, Allen Clark Res Ctr, Towcester, Northants, England
Campbell, D. S.
.
JOURNAL OF MATERIALS SCIENCE,
1968,
3
(05)
:544
-552
[7]
DEPOSITION OF TANTALUM TANTALUM OXIDE AND TANTALUM NITRIDE WITH CONTROLLED ELECTRICAL CHARACTERISTICS
[J].
KRIKORIAN, E
论文数:
0
引用数:
0
h-index:
0
KRIKORIAN, E
;
SNEED, RJ
论文数:
0
引用数:
0
h-index:
0
SNEED, RJ
.
JOURNAL OF APPLIED PHYSICS,
1966,
37
(10)
:3674
-+
[8]
ELECTRICAL AND STRUCTURAL PROPERTIES OF EPITAXIAL BCC TANTALUM FILMS
[J].
MARCUS, RB
论文数:
0
引用数:
0
h-index:
0
MARCUS, RB
.
JOURNAL OF APPLIED PHYSICS,
1966,
37
(08)
:3121
-&
[9]
A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E)
[J].
READ, MH
论文数:
0
引用数:
0
h-index:
0
READ, MH
;
ALTMAN, C
论文数:
0
引用数:
0
h-index:
0
ALTMAN, C
.
APPLIED PHYSICS LETTERS,
1965,
7
(03)
:51
-&
[10]
SCHNEIDER HG, 1968, WISS Z TH ILMENAU, V14, P165
←
1
2
→