EFFECT OF OXYGEN ON ELECTRICAL AND STURCTURAL PROPERTIES OF TRIODE-SPUTTERED TANTALUM FILMS

被引:21
作者
WATERHOU.N
WILCOX, PS
WILLMOTT, DJ
机构
关键词
D O I
10.1063/1.1659995
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:5649 / &
相关论文
共 20 条
[1]   PROPERTIES OF SUPERCONDUCTING NIOBIUM FILMS MADE BY ASYMMETRIC AC SPUTTERING [J].
FRERICHS, R ;
KIRCHER, CJ .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (12) :3541-&
[2]   SUPERCONDUCTIVE FILMS MADE BY PROTECTED SPUTTERING OF TANTALUM OR NIOBIUM [J].
FRERICHS, R .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (05) :1898-&
[3]   A HIGH CURRENT VACUUM DISCHARGE FOR TRIODE-SPUTTERING IN 10-4 TORR RANGE [J].
GAYDOU, FP .
VACUUM, 1967, 17 (06) :325-&
[4]   EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS [J].
GERSTENBERG, D ;
CALBICK, CJ .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :402-&
[5]   PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM [J].
GERSTENBERG, D .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (06) :542-+
[6]   The Mechanism of Reactive Sputtering [J].
Hollands, E. ;
Campbell, D. S. .
JOURNAL OF MATERIALS SCIENCE, 1968, 3 (05) :544-552
[7]   DEPOSITION OF TANTALUM TANTALUM OXIDE AND TANTALUM NITRIDE WITH CONTROLLED ELECTRICAL CHARACTERISTICS [J].
KRIKORIAN, E ;
SNEED, RJ .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (10) :3674-+
[8]   ELECTRICAL AND STRUCTURAL PROPERTIES OF EPITAXIAL BCC TANTALUM FILMS [J].
MARCUS, RB .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (08) :3121-&
[9]   A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J].
READ, MH ;
ALTMAN, C .
APPLIED PHYSICS LETTERS, 1965, 7 (03) :51-&
[10]  
SCHNEIDER HG, 1968, WISS Z TH ILMENAU, V14, P165