CHARACTERIZATION OF MO/B4C MULTILAYERS

被引：30

作者：

JANKOWSKI, AF

PERRY, PL

机构：

[1] Lawrence Livermore National Laboratory, Chemistry and Materials Science, Livermore

来源：

THIN SOLID FILMS | 1991年 / 206卷 / 1-2期

基金：

美国能源部;

关键词：

D O I：

10.1016/0040-6090(91)90452-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The Mo/B4C multilayer system is selected for maximum, normal incidence reflection of 6.7 nm X-rays. Application in projection lithography requires structural optimization for smooth layering and minimal interface roughness. A transmission electron microscopy analysis of samples prepared in cross-section reveals an intrinsic layer roughness despite attempts to refine sputter deposition parameters. The limitations in growth morphology are attributable to interfacial reactivity from inherent phase instability.

引用

页码：365 / 368

页数：4

共 11 条

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