NANOSIZED FCC THALLIUM INCLUSIONS IN ALUMINUM

被引:15
作者
JOHNSON, E
JOHANSEN, A
THOFT, NB
ANDERSEN, HH
SARHOLTKRISTENSEN, L
机构
[1] The Niels Bohr Institute for Astronomy,Physics and Geophysic, 0rsted Laboratory, Copenhagen, DK-2100
[2] Department of Solid State Physics, Riso National Laboratory, Roskilde
关键词
D O I
10.1080/09500839308240954
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ion implantation of pure aluminium with thallium induces the formation of nanosized crystalline inclusions of thallium with a f.c.c. structure. The size of the inclusions depends on the implantation conditions and subsequent annealing treatments, and is typically in the range from 1 to 10 nm. The inclusions are aligned topotactically with the aluminium matrix with a cube-cube orientation relationship, and they have a truncated octahedral shape bounded by {111} and {001} planes. The lattice parameter of the f.c.c. thallium inclusions is 0.484+/-0.002 nm, which is slightly but significantly larger than in the high-pressure f.c.c. thallium phase known to be stable above 3.8 GPa.
引用
收藏
页码:131 / 135
页数:5
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